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Volumn 190, Issue 1-4, 2002, Pages 151-156
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Structural, chemical and optical features of nanocrystalline Si films prepared by PECVD techniques
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Author keywords
Nanocrystallite; PECVD; Photoluminescence; Si; Thin film
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Indexed keywords
NANOSTRUCTURED MATERIALS;
OPTICAL PROPERTIES;
PHOTOLUMINESCENCE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING SILICON;
SUBSTRATES;
THERMAL EFFECTS;
THIN FILMS;
NANOCRYSTALLINE FILMS;
SEMICONDUCTING FILMS;
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EID: 0037042082
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(01)00877-7 Document Type: Conference Paper |
Times cited : (24)
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References (22)
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