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Volumn 190, Issue 1-4, 2002, Pages 151-156

Structural, chemical and optical features of nanocrystalline Si films prepared by PECVD techniques

Author keywords

Nanocrystallite; PECVD; Photoluminescence; Si; Thin film

Indexed keywords

NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

EID: 0037042082     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00877-7     Document Type: Conference Paper
Times cited : (24)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.