Initial growth of chemical-vapor-deposited Ru from bis(hexafluoroacetylacetonate)dicarbonyl ruthenium

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 31-37

  Cheng, Wei Yuan ^a   Hong, Lu Sheng ^a   Jiang, Jyh Chiang ^a   Chi, Yun ^b   Lin, Chien Ching ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

CVD; Initial growth; Ruthenium

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; QUANTUM THEORY; REACTION KINETICS; SUBSTITUTION REACTIONS; THERMAL EFFECTS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

COORDINATION COMPLEXES; DIFFUSION BARRIERS; LIGANDS; OXIDE SURFACES;

RUTHENIUM;

EID: 18844436431     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.018     Document Type: Article

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