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Volumn 20, Issue 4, 2002, Pages 1542-1547
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Wafer temperature measurements during dielectric etching in a MERIE etcher
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Author keywords
[No Author keywords available]
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Indexed keywords
COOLING;
DIELECTRIC PROPERTIES;
ELECTROSTATICS;
PHASE TRANSITIONS;
PLASMA ETCHING;
PRESSURE EFFECTS;
TEMPERATURE CONTROL;
TEMPERATURE MEASUREMENT;
THERMISTORS;
THERMODYNAMIC STABILITY;
COOLING PRESSURE;
DIELECTRIC ETCHING;
WAFER TEMPERATURE MEASUREMENT;
SEMICONDUCTOR MATERIALS;
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EID: 0035982586
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1495905 Document Type: Conference Paper |
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Times cited : (12)
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References (9)
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