A novel electron wave interference device using multiatomic steps on vicinal GaAs surfaces grown by metalorganic vapor phase epitaxy: Investigation of transport properties

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 3 SUPPL. B, 1997, Pages 1966-1971

  Akabori, Masashi ^a   Motohisa, Junichi ^a   Irisawa, Tomoki ^a   Hara, Shinjiroh ^a   Ishizaki, Jun Ya ^a   Fukui, Takashi ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Electron wave interference device; Fermi wavelength; Lateral surface superlattice; Metalorganic vapor phase epitaxy (MOVPE); Multiatomic steps; Transconductance oscillation

Indexed keywords

EID: 0343799421     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.1966     Document Type: Article

References (12)

1. H. Sakaki, K. Wagatsuma, J. Hamasaki and S. Saito: Thin Solid Films 36 (1976) 497.
2. Y. Tokura and K. Tsubaki: Appl. Phys. Lett. 51 (1987) 1807.
3. A. C. Warren, D. A. Antoniadis, H. I. Smith and J. Melngailis: IEEE Electron Dev. Lett. EDL-6 (1985) 294.
4. K. Ismail, W. Chu, D. A. Antoniadis and H. I. Smith: Appl. Phys. Lett. 52 (1988) 1071.
5. K. Tsubaki, Y. Tokura, T. Fukui, H. Saito and N. Susa: Electron. Lett. 25 (1988) 728.
6. K. Tsubaki, T. Honda, H. Saito and T. Fukui: Appl. Phys. Lett. 58 (1991) 376.
7. H. Sakaki: Jpn. J. Appl. Phys. 21 (1982) L381.
8. Y. Tokura, K. Tsubaki and N. Susa: Surf. Sci. 228 (1990) 280.
9. T. Fukui and H. Saito: Appl. Phys. Lett. 50 (1987) 824.
10. J. Motohisa, M. Akabori, S. Hara, J. Ishizaki, K. Ohkuri and T. Fukui: Phisica B 227 (1996) 295.
11. T. Fukui and H. Saito: Jpn. J. Appl. Phys. 29 (1990) 1483.
12. J. Ishizaki, S. Goto, M. Kishida, T. Fukui and H. Hasegawa: Jpn. J. Appl. Phys. 33 (1994) 721.