Electron trap distribution in thin oxide after high-field stress

Applied Physics Letters

Volumn 86, Issue 10, 2005, Pages 1-3

  Cheung, K P ^a   Hits, D ^a   Wang, Y ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRAP DISTRIBUTION; HOLE TRAPPING; SPATIAL DISTRIBUTION; TRAP FILLING;

ELECTRODES; LEAKAGE CURRENTS; MOS DEVICES; SEMICONDUCTING SILICON; STRESS ANALYSIS; SUBSTRATES; THIN FILMS;

ELECTRON TRAPS;

EID: 17944363351     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1879088     Document Type: Article

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