Structural, optical and electrical characterizations of μc-Si:H films deposited by PECVD

Solar Energy Materials and Solar Cells

Volumn 87, Issue 1-4, 2005, Pages 375-386

  Ambrosone, G ^a   Coscia, U ^a   Murri, R ^b   Pinto, N ^b   Ficcadenti, M ^b   Morresi, L ^b  

^a UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^b INFM and Dipartimento Di Fisica   (Italy)

Author keywords

Microcrystalline silicon; Structural properties; Transport properties

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; OPTICAL PROPERTIES; SILANES; SILICON;

ELECTRICAL TRANSPORT TRANSITION; HALL MOBILITY; MICROCRYSTALLINE SILICON; STRUCTURAL PROPERTIES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 17744387177     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.07.026     Document Type: Conference Paper

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