Study on the etch characteristics of BST thin films by using inductively coupled plasma

Journal of the Korean Physical Society

Volumn 45, Issue SUPPL., 2004, Pages

  Kim, Gwan Ha ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a   Park, Chi Sun ^b   Kwon, Kwang Ho ^b  

^a Chung Ang University   (South Korea)

^b Hanseo University   (South Korea)

Author keywords

BST; Etching; ICP; OES; QMS

Indexed keywords

EID: 12744258017     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (10)

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