Characteristics of neutral beam generated by reflection on a planar-type reflector and its etching properties

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 420-425

  Lee, D H ^a   Jung, S J ^a   Park, S D ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Low angle forward reflection technique; Neutral beam; Planar type reflector

Indexed keywords

CHEMICAL MODIFICATION; ETCHING; ION BEAMS; LIGHT REFLECTION;

NEUTRAL BEAMS;

MIRRORS;

COATING;

EID: 1342289362     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.09.019     Document Type: Article

References (12)

1. Yunogami T. Yokogawa K. Mizutani T. J. Vac. Sci. Technol. A 13 1995 952
2. M.J. Goeckner, T.K. Bennett, J.Y. Park, Z. Wang, S.A. Cohen, International Symposium on Plasma Process-Induced Damage, AVS, Monterey CA, 1997, p. 175
3. Yamamoto J. Kawasaki T. Sakaue H. Shingubara S. Horiike Y. Thin Solid Films 225 1993 124
4. Yokogawa K. Yunogami T. Mizutani T. Jpn. J. Appl. Phys. 35 1996 1902
5. Leone S.R. J. Appl. Phys. 34 1995 2073
6. Szabo A. Engel T. J. Vac. Sci. Technol. A 12 1994 648
7. M.J. Goeckner,1 T.K. Bennett, J.Y. Park, Z. Wang, S.A. Cohen, International Symposium on Plasma Process-Induced Damage, 1997, p. 175
8. Goeckner M.J. Bennett T.K. Cohen S.A. Appl. Phys. Lett. 71 7 1997 980
9. Lee D.H. Bae J.W. Park S.D. Yeom G.Y. Thin Solid Films 398 2001 647
10. Chung M.J. Lee D.H. Yeom G.Y. Thin Solid Films 420 2002 579
11. Lee D.H. Chung M.J. Park S.D. Yeom G.Y. Jpn. J. Appl. Phys. Lett. 41 2002 1412
12. Ono T. Orimoto N. Lee S.S. Simizu T. Esashi M. Jpn. J. Appl. Phys. 39 2000 6976