Dry Etching of YMnO3 thin Films in Ar/Cl2 and CF 4/Cl2 Plasmas

Journal of the Korean Physical Society

Volumn 43, Issue 5 I, 2003, Pages 738-742

  Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Inductively coupled plasma; XPS; XRD

Indexed keywords

EID: 0345413439     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.43.738     Document Type: Article

References (12)

1. T. Toshimura, N. Fujimura and D. Ito, J. Appl. Phys. 87, 3444 (2000).
2. M. Alexe, G. Kastner, D. Hesse and U. Gosele, Appl. Phys. Lett. 70, 3416 (1997).
3. J. D. Park and T. S. Oh, J. Korean Phys. Soc. 37, 1072 (2000).
4. T. J. Choi, Y. S. Kim and J. C. Lee, J. Korean Phys. Soc. 40, 188 (2002).
5. D. Mou, C. S. Petterson, J. Linnros and K. V. Rao, Appl. Phys. Lett. 73, 1532 (1998).
6. S. Imada, T. Kuraoka, E. Tokumitsu and H. Ishiwara, Jpn. J.Appl. Phys. 40, 666 (2001).
7. H. N. Lee, Y. T. Kim and Y. K. Park, Appl. Phys. Lett. 74, 3887 (1999).
8. H. Kitahara, K. Tadanaga, T. Minami, N. Fujiura and T. Ito. Jpn. J. Appl. Phys. 38, 5448 (1999).
9. D. C. Yoo, J. Y. Lee, I. S. Kim and Y. T. Kim, J. Crystal Growth 233, 243 (2001).
10. J. K. Jung and W. J. Lee, Jpn. J. Appl. Phys. 40, 1408 (2001).
11. Handbook of Chemistry and Physics, edited by D. R. Lide (CRC Press, Boca Raton, 1998).
12. J. H. Park, K. T. Kim, C. I. Kim and E. G. Chang, J. Korean Phys. Soc. 41, 993 (2002).