Structural and electrical properties of co-sputtered fluorinated amorphous carbon film

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 248-252

  Jung, Hae suk ^a   Park, Hyung Ho ^a  

^a Yonsei University   (South Korea)

Author keywords

Bonding configuration; Dielectric property; Fluorinated amorphous carbon film; Fluorine content

Indexed keywords

CHEMICAL BONDS; FLUORINE; GRAPHITE; MICROSTRUCTURE; PERMITTIVITY; POLYTETRAFLUOROETHYLENES; SPUTTERING;

CO-SPUTTERING;

AMORPHOUS FILMS;

EID: 0037011046     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00802-7     Document Type: Conference Paper

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