Surface analysis and bioreactions of F and Si containing a-C:H

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 191-194

  Hauert, R ^a   Muller U ^a   Francz, G ^a   Birchler, F ^b   Schroeder, A ^b   Mayer, J ^b   Wintermantel, E ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b ETH ZURICH   (Switzerland)

Author keywords

a C:H:F; Amorphous carbon; Bioreaction; Si a C:H; XPS

Indexed keywords

ACETYLENE; BIOREACTORS; CHEMICAL VAPOR DEPOSITION; FLUORINE; SEMICONDUCTING SILICON; STAINLESS STEEL; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED CARBON FILMS; PLASMA CHEMICAL VAPOR DEPOSITION; TETRAMETHYLSILANE; TRIFLUOROMETHANE;

AMORPHOUS FILMS;

EID: 0031248472     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00422-7     Document Type: Article

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