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Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 69-73

A model for stress generation and stress relief mechanisms applied to as-deposited filtered cathodic vacuum arc amorphous carbon films

(6) Bilek, M M M a Verdon, M a Ryves, L a Oates, T W H a Ha, C T a McKenzie, D R a

a UNIVERSITY OF SYDNEY (Australia)

Author keywords

Filtered cathodic vacuum arc; Plasma immersion ion implantation; Stress relaxation

Indexed keywords

CARBON; COATINGS; DENSIFICATION; ELECTRIC POTENTIAL; ION IMPLANTATION; STRESS RELAXATION; VACUUM;

CARBON FILMS; FILTERED CATHODIC VACCUM ARC; PLASMA IMMERSION ION IMPLANTATION; PULSING FREQUENCY;

THIN FILMS;

EID: 17644363700 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.11.159 Document Type: Conference Paper

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.