Physical approximants to electron scattering

Microelectronic Engineering

Volumn 34, Issue 2, 1997, Pages 147-154

  Messina, G ^a   Paoletti, A ^a,b   Santangelo, S ^a   Tucciarone, A ^a,b  

^a INFM   (Italy)

^b UNIVERSITY OF ROME TOR VERGATA   (Italy)

Author keywords

Diamond; E beam lithography; Electron scattering; Monte carlo simulation; Numerical approximation and analysis

Indexed keywords

APPROXIMATION THEORY; BACKSCATTERING; COMPOSITE MATERIALS; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; INTERPOLATION; MONTE CARLO METHODS; SUBSTRATES;

BUCKINGHAM'S THEOREM OF DIMENSIONAL ANALYSIS;

ELECTRON SCATTERING;

EID: 0031235021     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(97)82564-6     Document Type: Article

References (9)

1. G. Messina, A. Paoletti, S. Santangelo and A. Tucciarone, A single quality factor for electron backscattering from thin films, Microelectron. Engrg. 27 (1995) 183-186.
2. G. Messina, S. Santangelo, A. Paoletti and A. Tucciarone, Monte Carlo modelling of electron beam lithography: a scaling law, Microsys. Technol. 1 (1994) 23-29.
3. For an exhaustive discussion of the II theorem see, for example, P.W. Bridgman, Dimensional Analysis, Yale University Press New Haven, 1931.
4. K. Murata, Electron Beam Interactions with Solids, SEM, Inc., AMF O'Hare, Chicago, pp. 311-329.
5. R.J. Hawryluk, A.M. Hawryluk and H.I. Smith, Energy dissipation in a thin polymer film by electron beam scattering, J. Appl. Phys. 45 (1974) 2551-2566.
6. D.C. Joy, The spatial resolution limit of electron lithography, Microelectron. Engrg. 1 (1983) 103-119.
7. G. Messina, A. Paoletti, S. Santangelo and A. Tucciarone, Electron scattering in microstructure processes, La Rivista del Nuovo Cimento 15 (1992) 1-57.
8. H. Niedrig, Electron backscattering from thin films, J. Appl. Phys. 53 (1982) R15-R49.
9. S. Leisegang, Zur Mehrfachstreuung von Elektronen in duennen Schichten, Z. Phys. 132 (1952) 183-198.