Resistless patterning of quantum nanostructures by local anodization with an atomic force microscope

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 517-522

  Bouchiat, V ^a   Faucher, M ^a,b   Fournier, T ^a   Pannetier, B ^a   Thirion, C ^a   Wernsdorfer, W ^a   Clement N ^b   Tonneau, D ^b   Dallaporta, H ^b   Safarov, S ^b   Villegier, J C ^c   Fraboulet, D ^d   Mariolle, D ^d   Gautier, J ^d  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^b CNRS   (France)

^c CEA GRENOBLE   (France)

^d CEA LETI   (France)

Author keywords

Atomic force microscopy; Lithography; Nanostructures; Quantum devices; Silicon on insulator

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; ETCHING; HYDROGEN; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; NIOBIUM; PASSIVATION; QUANTUM ELECTRONICS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SILICA; SILICON ON INSULATOR TECHNOLOGY; ULTRATHIN FILMS;

QUANTUM NANOSTRUCTURES;

MICROELECTRONICS;

EID: 17344384173     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00524-5     Document Type: Conference Paper

References (26)