Evaluation of calixarene-derivatives as high-resolution negative tone electron-beam resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2958-2961

  Sailer, H ^a   Ruderisch, A ^a   Kern, D P ^a   Schurig, V ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL MODIFICATION; COMPOSITION EFFECTS; CROSSLINKING; DERIVATIVES; ELECTRON BEAM LITHOGRAPHY; ETCHING; MOLECULES; PHOTORESISTS; SYNTHESIS (CHEMICAL);

ALLYLGROUP; CALIXARENE; HIGH RESOLUTION CAPABILITY; HIGH RESOLUTION NEGATIVE TONE ELECTRON BEAM RESISTS;

ORGANIC COMPOUNDS;

EID: 0036883188     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521737     Document Type: Article

References (10)

1. J. Fujita, Y. Onishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett. 68, 1297 (1996).
2. Y. Onishi, J. Fujita, Y. Ochiai, and S. Matsui, Microelectron. Eng. 35, 117 (1997).
3. C. D. Gutsche, Calixarenes (Royal Society of Chemistry, Cambridge, UK, 1989)
4. C. D. Gutsche, Calixarenes Revisited (Royal Society of Chemistry, Cambridge, 1998).
5. S. Yasin, D. G. Hasko, and F. Carecanac, Jr., J. Vac. Sci. Technol. B 19, 311 (2001).
6. C. D. Gutsche and M. Iqbal, Org. Synth. 68, 234 (1990).
7. C. D. Gutsche, J. A. Levine, and P. K. Sujeeth, J. Org. Chem. 50, 5802 (1985).
8. C. D. Gutsche, B. Dhawan, J. A. Levine, K. H. No, and L. J. Bauer, Tetrahedron 39, 409 (1983).
9. S. Stähle, K.-D. Schock, F. E. Prins, and D. P. Kern, Microelectron. Eng. 35, 465 (1997).
10. F. E. Prins, J. Pfeiffer, S. Raible, D. P. Kern, and V. Schurig, Microelectron. Eng. 41, 42, 359 (1998).