In situ photoemission study on initial growth of HfO2 films on Si(1 0 0)

Surface Science

Volumn 581, Issue 2-3, 2005, Pages 236-240

  Xu, R ^a   Yan, Z J ^a   Chen, S ^a   Fan, Y L ^a   Ding, X M ^a   Jiang, Z M ^a   Li, Z S ^b  

^a FUDAN UNIVERSITY   (China)

^b AARHUS UNIVERSITY   (Denmark)

Author keywords

Insulating films; Semiconductor insulator interface; Synchrotron radiation photoelectron spectroscopy

Indexed keywords

DEPOSITION; ELECTRON BEAMS; EVAPORATION; HAFNIUM COMPOUNDS; INSULATING MATERIALS; PHOTOELECTRON SPECTROSCOPY; SUBSTRATES; SYNCHROTRON RADIATION; THIN FILMS;

BAND OFFSET; INSULATING FILMS; INTERFACE LAYERS; SEMICONDUCTOR-INSULATOR INTERFACES;

FILM GROWTH;

EID: 17044408014     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.02.040     Document Type: Article

References (18)

1. G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
2. R.M.C de Almeida, and I.J.R. Baumvol Surf. Sci. Rep. 49 2003 1
3. J. Ramdani Appl. Surf. Sci. 159 2000 127
4. V. Misra, G. Lucovsky, and G. Parsons Mater. Res. Bull. 27 2002 212
5. B.W. Busch, W.H. Schulte, E. Garfunkel, T. Gustafsson, W. Qi, R. Nieh, and J. Lee Phys. Rev. B 62 2002 R13290
6. M.-Y. Ho J. Appl. Phys. 93 2003 1477
7. N. Miyata, M. Ichikawa, T. Nabatame, T. Horikawa, and A. Toriumi Jpn. J. Appl. Phys. 42 2003 L138
8. S. Suzer, S. Sayan, M.M. Banaszak Holl, E. Garfunkel, Z. Hussain, and N.M. Hamdan J. Vac. Sci. Technol. 21 1 2003 106
9. A. Pasquarello, M.S. Hybertsen, and R. Car Phys. Rev. B 53 1996 10942
10. R.L. Opila, G.D. Wilk, M.A. Alam, R.B. van Dover, and B.W. Busch Appl. Phys. Lett. 81 2002 1788
11. M.D. Ulrich, J.G. Hong, J.E. Rowe, G. Lucovsky, A.S.-Y. Chan, and T.E. Madey J. Vac. Sci. Technol. B 21 4 2003 1777
12. O. Renault, D. Samour, J.F. Damlencourt, D. Blin, F. Martin, S. Marthon, N.T. Barrett, and P. Besson Appl. Phys. Lett. 81 2002 3627
13. M. Kundu, N. Miyata, and M. Ichikawa J. Appl. Phys. 93 2003 1498; M. Copel, and M.C. Reuter Appl. Phys. Lett. 83 2003 3398.
14. M. Kundu, N. Miyata, and M. Ichikawa J. Appl. Phys. 93 2003 1498; M. Copel, and M.C. Reuter Appl. Phys. Lett. 83 2003 3398.
15. H. Kato, T. Nango, T. Miyagwa, T. Katagiri, K. Soo Seol, and Y. Ohki J. Appl. Phys. 92 2002 1106
16. M.C. Asensio, E.G. Michel, E.M. Oeillg, and R. Miranda Appl. Phys. Lett. 51 1987 1714
17. F. Lutz, J.L. Bischoff, L. Kubler, and D. Bolmont Phys. Rev. B 40 1989 10356
18. M. Tabe, T.T. Chiang, I. Linau, and W.E. Spicer Phys. Rev. B 34 1986 2706