Deposition of PTFE thin films by RF plasma sputtering on 〈1 0 0〉 silicon substrates

Applied Surface Science

Volumn 245, Issue 1-4, 2005, Pages 202-207

  Bodas, Dhananjay S ^a   Mandale, A B ^a,b   Gangal, S A ^a  

^a UNIVERSITY OF PUNE   (India)

^b NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

Contact angle measurement; FTIR; PTFE; RF plasma sputtering; XPS

Indexed keywords

ANGLE MEASUREMENT; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMAS; POLYTETRAFLUOROETHYLENES; SILICON; SPUTTERING; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

DIIODOMETHANE; FTIR; MIRROR POLISHED SILICON; POLYMER MATERIALS; RF PLASMA SPUTTERING;

THIN FILMS;

EID: 17044403834     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.10.023     Document Type: Article

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