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Materials Letters

Volumn 59, Issue 14-15, 2005, Pages 1836-1840

Synthesis and characterization of hafnium tert-butylacetoacetate as new MOCVD precursor for HfO2 films

(3) Pasko, Sergej a,b Hubert Pfalzgraf, Liliane G a Abrutis, Adulfas b

a INST DE RECHERCHES SUR LA CATALYSE (France)

b VILNIUS UNIVERSITY (Lithuania)

Author keywords

ketoesterates; Chemical vapor deposition; Hafnium; Oxide; Thin films

Indexed keywords

CHARACTERIZATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASS SPECTROMETRY; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SAPPHIRE; STOICHIOMETRY; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

Β-KETOESTERATES; ELEMENTAL ANALYSIS; INSULATING LAYERS; VOLATILITY;

HAFNIUM COMPOUNDS;

EID: 17044395557 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2005.02.024 Document Type: Article

Times cited : (13)

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