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Journal of Photopolymer Science and Technology

Volumn 9, Issue 4, 1996, Pages 627-636

Wet-silylation process for X-ray and EUV lithographies

(4) Oizumi, Hiroaki a Yamashita, Yoshio b,c Ogawa, Taro a Ohtani, Masayuki c

a SORTEC Corporation (Japan)

b HITACHI LTD (Japan)

c NIKON CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 16844377450 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.9.627 Document Type: Article

Times cited : (4)

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