High-resolution surface imaging process using difunctional silylating reagent B(DMA)MS for ArF excimer laser lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2438, Issue , 1995, Pages 465-473

  Maeda, Katsumi ^a   Ohfuji, Takeshi ^a   Aizaki, Naoaki ^a   Hasegawa, Etsuo ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; AMINES; CHEMICAL REACTIONS; EXCIMER LASERS; IMAGING TECHNIQUES; MASKS; PERFORMANCE;

DEPTH OF FOCUS; DIFUNCTIONAL SILYLATING REAGENTS; DIMETHYLSILYLDIMETHYLAMINE; HIGH RESOLUTION SURFACE IMAGING; LITHOGRAPHIC PERFORMANCE; PHASE SHIFT MASKS; SILYLATION;

PHOTOLITHOGRAPHY;

EID: 0029214360     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)