Resolution limitation of proximity x-ray lithography determined by waveguide effect

Japanese Journal of Applied Physics

Volumn 31, Issue 12 S, 1992, Pages 4228-4231

  Ogawa, Taro ^a   Murayama, Seiichi ^a   Mochiji, Kozo ^a   Takeda, Eiji ^a  

^a HITACHI LTD   (Japan)

Author keywords

Mask pattern thickness; Maxwell s equations; Proximity; Resolution; Wave guide effect; X ray lithography

Indexed keywords

COMPUTER SIMULATION; MASKS; WAVEGUIDES;

MAXWELL'S EQUATIONS;

X RAY LITHOGRAPHY;

EID: 0026981751     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.31.4228     Document Type: Article

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