Fabrication of 0.1 µm line-and-space patterns using soft x-ray reduction lithography

Japanese Journal of Applied Physics

Volumn 33, Issue 1R, 1994, Pages 360-

  Nagata, Hiroshi ^a   Ohtani, Masayuki ^a   Murakami, Katsuhiko ^a   Oshino, Tetsuya ^a   Oizumi, Hiroaki ^a   Maejima, Yukihiko ^a   Watanabe, Takeo ^a   Taguchi, Takao ^a   Yamashita, Yoshio ^a   Atoda, Nobufumi ^a  

^a SORTEC Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; MASKS;

MULTILAYER MIRRORS; REDUCTION LITHOGRAPHY; SOFT X-RAY;

SEMICONDUCTOR DEVICES;

EID: 0028201098     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.360     Document Type: Article

References (9)

1. H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii 1989 J. Vac. Sci. & Technol. B 7 1648.
2. J. E. Bjorkholm et al. 1990 J. Vac. Sci. & Technol. B 8 1509.
3. D. A. Tichenor et al. 1991 Opt. Lett. 16 1557.
4. T. E. Jewell, J. M. Rodgers and K. P. Thompson 1990 J. Vac. Sci. & Technol. B 8 1519.
5. K. Kurihara, H. Kinoshita, N. Takeuchi, T. Mizota, T. Haga and Y. Torii 1991 J. Vac. Sci. & Technol. B 9 3189.
6. T. Haga, T. Mizota, H. Takenaka, K. Kurihara, H. Kinoshita and Y. Torii Ext. Abstr. 53rd Autumn Meet. Japan Society of Applied Physics, Osaka, September (1992) 16p-ZL2.
7. K. Murakami, H. Nakamura, T. Oshino M. Ohtani and H. Nagata 1992 Jpn. J. Appl. Phys. 31 L1500.
8. K. Murakami, H. Nakamura, T. Oshino M. Ohtani and H. Nagata 1992 Proc. Soc. Photo-Opt. Instrum. Eng. 1742 351.
9. M. Kodaira, N. Awaji, T. Kishimoto, H. Usami and M. Watanabe 1991 Jpn. J. Appl. Phys. 30 3043.