Negative resist image by dry etching as a surface imaging process using focused ion beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 189-195

  Arshak, Khalil ^a   Mihov, Miroslav ^a   Arshak, Arous ^a   McDonagh, Declan ^b   Sutton, David ^a   Newcomb, Simon B ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b Integrated Device Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; BACKSCATTERING; CROSSLINKING; DRY ETCHING; ELECTRON BEAMS; IMAGING TECHNIQUES; ION BEAM LITHOGRAPHY; MOS DEVICES; NEGATIVE RESISTANCE; REACTIVE ION ETCHING; SPUTTERING;

FOCUSED ION BEAMS (FIB) LITHOGRAPHY; TOP SURFACE IMAGING (TSI);

ION BEAMS;

EID: 1642359706     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1641058     Document Type: Conference Paper

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