PRIME process with Shipley SPR505A resist - Simulations and experiments

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 783-791

  Arshak, K ^a   Mihov, M ^a   Arshak, A ^a   McDonagh, D ^b   Pomeroy, M ^a   Campion, M ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

^b Integrated Device Technology Inc   (United States)

Author keywords

Liquid phase silylation; Nanolithography modelling; PRIME process

Indexed keywords

COMPUTER SIMULATION; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTRONICS; NANOTECHNOLOGY; SEMICONDUCTING SILICON; ULTRAVIOLET SPECTROSCOPY;

LIQUID-PHASE SILYLATION;

PHOTORESISTS;

EID: 0036643623     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00446-X     Document Type: Conference Paper

References (11)