Nanostructure patterns for shipley SPR505A resist using PRIME process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 1013-1024

  Arshak, Khalil ^a   Mihov, Miroslav ^a   Arshak, Arous ^a   McDonagh, Declan ^a   Pomeroy, Michael ^a   Newcomb, Simon ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

Liquid phase silylation; Nanolithography modelling; PRIME process

Indexed keywords

COMPUTER SIMULATION; CROSSLINKING; DIFFUSION; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY; SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY;

NANOSTRUCTURE PATTERNS; TOP SURFACE IMAGING (TSI);

PHOTORESISTS;

EID: 0036030735     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474177     Document Type: Conference Paper

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