Micro- and Macro-Texture Investigation in Damascene Cu Interconnect Lines

Physics of Metals and Metallography

Volumn 96, Issue SUPPL., 2003, Pages

  Mirpuri, Kabirkumar ^a   Szpunar, Jerzy ^a  

^a MCGILL UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1642268298     PISSN: 0031918X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. Edelstein, D., Heidenreich, J., Goldblatt, R., Cote, W., Uzoh, C., Lustig, N., Roper, P., McDevitt, T., Motsiff, W., Simon, A., Dukovic, J., Wachnik, R., Rathore, H., Schulz, R., Su, L., Luce, S., and Slattery, J., IEEE Int. Electron Devices Meeting Technical Digest, 1997, p. 773.
2. Brongersma, H., Vervoort, I., Judelwicz, M., Bender, H., Conard, T., Vandervorst, W., Beyer, G., Richard, E., Palmans, R., Lagrange, S., and Maex, K., Proc. IEEE 1999 Int. Interconnect Technology Conference, 1999, pp. 290-292.
3. Lee, H., Lopatin, S.D., and Wong, S.S., Proc. IEEE 2000 Int. Interconnect Technology Conference, 2000, pp. 114-116.
4. Ryu, C., Loke, A.L.S., Nogami, T., and Wong, S.S., Reliability Physics Symposium, 35th Annual Proc., IEEE International, 1997, pp. 201-205.
5. Vanasupa, L., Joo, Y.-C., Besser, P. R., Pramanick, S., J. Appl. Phys., 1999, vol. 85, no. 5, p. 2583.
6. Thompson, C.V. and Carel, R., J. Mech. Phys. Solids, 1996, vol. 44, p. 657.
7. TexTools-Ver. 3.1, 2000, ww.resmat.com.
8. Vanasupa, L., Pinck, D., Joo, Y.-C., Nogami, T., Pramanick, S., Lopatin, S., and Yang, K., Electrochem. Solid-State Lett., 1999, vol. 2, no. 6, pp. 275-277.
9. Lingk, C. and Gross, M.E., J. Appl. Phys., 1998, vol. 84, no. 10, pp. 5547-5553.
10. Lingk, C., Gross, M.E., and Brown, W.L., J. Appl. Phys., 2000. vol. 87, no. 5, pp. 2232-2236.
11. Jiang, Q.-T., Tsai, M.-H., Frank, A., Parihar, V., Nowell, M., Auger, R.A., Havemann, R.H., and Luttmer, J.D., Proc. IEEE Int. Interconnect Technology Conference, 2001, pp. 400-404.
12. Riege, S.P. and Thompson, C.V., Scr. Mater., 1999, vol. 41, no. 4, pp. 403-408.
13. Zhang, J.-M., Xu, K. -W., and Ji, V., J. Crystal Growth, 2001. vol. 226, pp. 168-174.
14. Zhang, J., Xu, K., and He, J., J. Mater. Sci. Lett., 1999, vol. 18, pp. 471-473.
15. Wei, H.L., Huang, H., Woo, C.H., Zheng, R.K., Wen, G.H., and Zhang, X.X., Appl. Phys. Lett., 2002, vol. 80, no. 13, pp. 2290-2292.
16. Kozlov, V.M. and Bicelli, L. Peraldo, Mater. Chem. Phys., 2002, vol. 77, pp. 289-293.
17. Yeo, I.-S., Anderson, S.G.H., Ho, P.S., and Hu, C.K., J. Appl. Phys., 1995, vol. 78, p. 953.