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Volumn 3, Issue , 2001, Pages 141-147

Surface micromachined electrothermal V-beam micromotors

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROTHERMAL MICROACTUATORS;

EID: 1542537637     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (13)
  • 3
    • 0033733840 scopus 로고    scopus 로고
    • Low Voltage Electrothermal Vibromotor for Silicon Optical Bench Applications
    • Pai, M. Tien, N.C. 1999. Low Voltage Electrothermal Vibromotor for Silicon Optical Bench Applications. Sensors and Actuators. 83: 237-243.
    • (1999) Sensors and Actuators , vol.83 , pp. 237-243
    • Pai, M.1    Tien, N.C.2
  • 4
    • 0042638073 scopus 로고    scopus 로고
    • Electrothermal Actuators Fabricated in Four-Level Planarized Surface Micromachined Polycrystalline Silicon
    • Comtois, J.H., Michalicek, M.A., Barron, C.C. 1998. Electrothermal Actuators Fabricated in Four-Level Planarized Surface Micromachined Polycrystalline Silicon. Sensors and Actuators. A 70: 23-31.
    • (1998) Sensors and Actuators. A , vol.70 , pp. 23-31
    • Comtois, J.H.1    Michalicek, M.A.2    Barron, C.C.3
  • 8
    • 84921463504 scopus 로고    scopus 로고
    • Analysis and Design of Electrothermal Actuators Fabricated from Single Crystal Silicon
    • Maloney, J.M., DeVoe, D.L., Schreiber, D.S. 2000. Analysis and Design of Electrothermal Actuators Fabricated from Single Crystal Silicon. ASME IMECE 2000. 233-240.
    • (2000) ASME IMECE 2000 , pp. 233-240
    • Maloney, J.M.1    DeVoe, D.L.2    Schreiber, D.S.3
  • 9
    • 0030182958 scopus 로고    scopus 로고
    • Electrothermal Responses of Lineshape Microstructures
    • Lin, L. Chiao, M. 1996. Electrothermal Responses of Lineshape Microstructures. Sensors and Actuators. A 55: 35-41.
    • (1996) Sensors and Actuators. A , vol.55 , pp. 35-41
    • Lin, L.1    Chiao, M.2
  • 10
    • 0021463798 scopus 로고
    • Precise Determination of Lattice Parameter and Thermal Expansion Coefficient of Silicon Between 300 and 1500 K
    • Okada, Y., Tokumaru, Y. 1984. Precise Determination of Lattice Parameter and Thermal Expansion Coefficient of Silicon Between 300 and 1500 K. Journal of Applied Physics. 56: 314-320.
    • (1984) Journal of Applied Physics , vol.56 , pp. 314-320
    • Okada, Y.1    Tokumaru, Y.2
  • 13
    • 0030205743 scopus 로고    scopus 로고
    • Change in Temperature Coefficient of Resistance of Heavily Doped Polysilicon Resistors Caused by Electrical Trimming
    • Kato, K., Ono, T. 1996. Change in Temperature Coefficient of Resistance of Heavily Doped Polysilicon Resistors Caused by Electrical Trimming. Japanese Journal of Applied Physics. 8: 4209-4215.
    • (1996) Japanese Journal of Applied Physics , vol.8 , pp. 4209-4215
    • Kato, K.1    Ono, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.