C-axis orientation of A1N films prepared by ECR PECVD

Thin Solid Films

Volumn 279, Issue 1-2, 1996, Pages 17-22

  Soh, Ju Won ^a   Jang, Seong Soo ^a   Jeong, In Seop ^b   Lee, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Samsung Electro Mechanics   (South Korea)

Author keywords

Aluminium nitride; Chemical vapour deposition; Plasma processing and deposition; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; ELECTRON CYCLOTRON RESONANCE; HYDROGEN; LOW TEMPERATURE OPERATIONS; NITROGEN; PLASMA APPLICATIONS; SEMICONDUCTING ALUMINUM COMPOUNDS; X RAY CRYSTALLOGRAPHY;

ALUMINUM NITRIDES; MICROWAVE POWER; PLASMA PROCESSING; TRIMETHYLALUMINUM;

SEMICONDUCTING FILMS;

EID: 0030164387     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08027-9     Document Type: Article

References (17)

1. G.A. Cox, D.O. Cummins, K. Kawabe and T. Tredgold, J. Phys. Chem. Solids, 28 (1967) 543.
2. K. Tsubouchi, K. Sugai and Mikoshiba, Proc. IEEE Symp. Ultrasonics, 14, 1983, p. 340.
3. N. Chubachi, M. Minakata, Y. Kikuchi, Jpn. J. Appl. Phys., 13, Suppl. 2 (1974) 737.
4. H.M. Masasevit, F.M. Erdmann and W.I. Simpson, J. Electrochem. Soc., 118 (1911) 1864.
5. K. Tsubouchi and N. Mikoshiba, IEEE Trans. Sonics Ultrasonics., 32 (1985) 634.
6. T. Shiosaki, T. Yamamoto, T. Oda and A. Kawabata, Appl. Phys. Lett., 50 (1980) 643.
7. H. Okano, Y. Takahashi, T. Tanaka, K. Shibata and S. Nakano, Jpn. J. Appl. Phys., 31 (1992) 3446.
8. M.T. Duffy, C.C. Wang, G.D. O'Clock, Jr., S.H. McFarlane III and P.J. Zanzucchi, J. Electron. Mater., 2 (1973) 359.
9. S.W. Chung, J.S. Shin, J.W. Kim, K.S. No, S.S. Chun and W.J. Lee, J. Mater. Res., 10 (1995) 447.
10. I. Kim, S.D. Ahn, B.W. Cho, S.T. Ahn, J.Y. Lee, J.S. Chun and W.J. Lee, Jpn. J. Appl. Phys., 33 (1994) 6691.
11. A.T. Collins, E.C. Ligttowlers and P.J. Dean, Phys. Rev., 158 (1967) 833.
12. W. Zhang, Y. Someno, M. Sasaki and T. Hirai, Jpn. J. Appl. Phys., 32 (1993) L116.
13. L.A. Davis, N.C. MacDonald, P.W. Palmberg, G.E. Riach and R.E. Weber, Handbook of Auger Electron Spectroscopy, Perkin Elmer, Eden Prairie, 1978, 2nd edn.
14. F. Hasegawa, T. Takahashi, K. Kubo and Y. Nannichi, Jpn. J. Appl. Phys., 26 (1987) 1555.
15. A. Matsumoto, S. Meikle, Y. Nakanishi and Y. Hatanaka, Jpn. J. Appl. Phys., 31 (1992) L423.
16. L. Pauling, The Nature of the Chemical Bond, Cornell University Press, 1960.
17. A. Roth, Vacuum Technology, Elsevier, Amsterdam, 1989, p. 39.