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Volumn 152, Issue 2, 2005, Pages

A model for the etching of nanoporous silica in C4F8 plasmas based on pore geometry and porosity effects

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; DECOMPOSITION; FLUOROCARBONS; ION BOMBARDMENT; PLASMA ETCHING; POLYMERIZATION; POLYMERS; PORE SIZE; POROSITY; SILICA;

EID: 14744281074     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1850375     Document Type: Article
Times cited : (3)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.