Nanoscopic observation of bistable piezoresponse, polarization retention, and domain imaging of sub-50 nm-thick (Pb,La)(Zr,Ti)O3 thin films

Materials Letters

Volumn 59, Issue 10, 2005, Pages 1234-1238

  Tokuda, Takashi ^a   Nakano, Takashi ^a   Fujiu, Daisuke ^a   Ohta, Jun ^a   Nunoshita, Masahiro ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Domain imaging; Ferroelectrics; PLZT; Scanning probe microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; PHASE TRANSITIONS; X RAY DIFFRACTION;

DOMAIN IMAGING; MICROSCOPIC PIEZORESPONSE; PLZT; SCANNING PROBE MICROSCOPY;

THIN FILMS;

EID: 14644437790     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.10.081     Document Type: Article

References (29)

1. K. Torii, T. Kaga, K. Kushida, H. Takeuchi, and E. Takeda Jpn. J. Appl. Phys. 30 1991 3562
2. H. Funakubo, T. Hioki, M. Otsu, K. Shinozaki, and N. Mizutani Jpn. J. Appl. Phys. 32 1993 4175
3. Y. Sakashita, H. Sagawa, K. Tominaga, and M. Okada J. Appl. Phys. 73 1993 1
4. T. Hase, T. Sakuma, Y. Miyasaka, K. Hirata, and N. Hosokawa Jpn. J. Appl. Phys. 32 1993 4061
5. T. Horikawa, N. Mikami, T. Makita, J. Tanimura, M. Kataoka, K. Sato, and M. Nunoshita Jpn. J. Appl. Phys. 32 1993 4126
6. K.R. Udayakumar, P.J. Schuele, J. Chen, S.B. Krupanidhi, and L.E. Cross J. Appl. Phys. 77 1995 3981
7. H. Fujisawa, M. Shimizu, T. Horiuchi, and T. Shiosaki Jpn. J. Appl. Phys. 35 1996 4913
8. S.B. Ren, C.J. Lu, J.S. Jiu, H.M. Shen, and Y.N. Wang Phys. Rev., B 54 1996 R14337
9. M. Yamaguchi, T. Nagamoto, and O. Omoto Thin Solid Films 300 1997 299
10. J. Zhu, X. Zhang, Y. Zhu, and S.B. Desu J. Appl. Phys. 83 1998 1610
11. S. Horii, S. Yokoyama, H. Nakajima, and S. Horita Jpn. J. Appl. Phys. 38 1999 5378
12. T. Watanabe, A. Saiki, K. Saito, and H. Fuakubo J. Appl. Phys. 89 2001 3934
13. A. Gruverman, H. Tokumoto, A.S. Prakash, S. Aggarwal, B. Yang, M. Wuttig, R. Ramesh, O. Auciello, and T. Venkatesan Appl. Phys. Lett. 71 1997 3492
14. G. Zavala, J.H. Fendler, and S.-T. McKinstry J. Appl. Phys. 81 1997 7480
15. J.W. Hong, W. Jo, D.C. Kim, S.M. Cho, H.J. Nam, H.M. Lee, and J.U. Bu Appl. Phys. Lett. 75 1999 3183
16. C.S. Ganpule, A. Stanishevsky, Q. Su, S. Aggarwal, J. Melngailis, E. Williams, and R. Ramesh Appl. Phys. Lett. 75 1999 409
17. X.Q. Chen, H. Yamada, T. Horiuchi, K. Matsushige, S. Watanabe, M. Kawai, and P.S. Weiss J. Vac. Sci. Technol., B 17 1999 1930
18. T. Tybell, C.H. Ahn, and J.-M. Triscone Appl. Phys. Lett. 72 1998 1454
19. C. Durkan, D.P. Chu, P. Migliorato, and M.E. Welland Appl. Phys. Lett. 76 2000 366
20. P. Paruch, T. Tybell, and J.-M. Triscone Appl. Phys. Lett. 79 2001 530
21. C. Yoshida, T. Tamura, K. Kondo, and K. Takasaki Appl. Phys. Lett. 79 2001 1339
22. T. Tybell, P. Paruch, T. Giamarchi, and J.-M. Triscone Phys. Rev. Lett. 89 2002 097601
23. G.H. Haertling, and C.E. Land J. Am. Ceram. Soc. 54 1971 1
24. K. Nashimoto, S. Nakamura, T. Morikawa, H. Moriyama, M. Watanabe, and E. Osakabe Jpn. J. Appl. Phys. 38 1999 5641
25. C.H. Jin, Y.K. Zou, V. Fuflyigin, S.W. Liu, Y.L. Lu, J. Zhao, and M.C. Golomb J. Lightwave Technol. 18 2000 807
26. B. Li, J. Zhou, L. Li, X.-J. Wang, X.-H. Liu, and J. Zi Appl. Phys. Lett. 83 2003 4704
27. X. Dai, Z. Xu, J.-F. Li, and D. Viehland J. Appl. Phys. 79 1995 2023
28. E. Birks, M. Kusnetsov, and A. Sternberg Ferroelectrics 173 1995 45
29. V. Bobnar, Z. Kutnjak, R. Pirc, and A. Levstik Ferroelectrics 240 2000 1479