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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 12, 2004, Pages 8300-8303

Etching of copper films for thin film transistor liquid crystal display using inductively coupled chlorine-based plasmas

(4) Jang, Kyung Hwan a,b Lee, Won Jeong b Kim, Hyung Rae b Yeom, Geun Young a

a Sungkyunkwan University (South Korea)

b LG Electronics Inc (South Korea)

Author keywords

Cl2 Ar plasma; Copper (Cu); Etch product; Etching; Inductively coupled plasma

Indexed keywords

ARGON; CHLORINE; COPPER; ETCHING; GASES; INDUCTIVELY COUPLED PLASMA; IRRADIATION; METALLIC FILMS; PLASMAS; THIN FILM TRANSISTORS; ULTRAVIOLET RADIATION;

CL2/AR PLASMA; ETCH PRODUCTS; ETCH PROFILE; ETCH RATE;

LIQUID CRYSTAL DISPLAYS;

EID: 13644271816 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.8300 Document Type: Article

Times cited : (10)

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