High-sensitivity plasma-induced etch damage of water-bonded AlGaInP/mirror/Si light-emitting diodes

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 766-771

  Wuu, D S ^a   Horng, R H ^a   Huang, S H ^a   Chung, C R ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b DA YEH UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; LEAKAGE CURRENTS; MIRRORS; PLASMA DENSITY; PLASMA ETCHING; PROBES; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON WAFERS; SURFACE ROUGHNESS;

ETCH PROFILE; ION FLUX; LANGMUIR PROBE; PLASMA TREATMENT; SUBSTRATE BIAS POWER;

LIGHT EMITTING DIODES;

EID: 0036565031     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1467665     Document Type: Article

References (14)