UHV-CVD growth and annealing of thin fully relaxed Ge films on (0 0 1)Si

Optical Materials

Volumn 27, Issue 5, 2005, Pages 822-826

  Halbwax, M ^a   Rouviere, M ^a,b   Zheng, Y ^c   Debarre, D ^a   Nguyen, Lam H ^a   Cercus, J L ^a   Clerc, C ^a   Yam, V ^a   Laval, S ^a   Cassan, E ^a   Bouchier, D ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b STMICROELECTRONICS   (France)

^c SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DISLOCATIONS (CRYSTALS); GROWTH KINETICS; LIGHT ABSORPTION; MORPHOLOGY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; THERMAL CYCLING; THERMAL EXPANSION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DISLOCATION DENSITY; OPTICAL TRANSMISSION SPECTROSCOPY; STRUCTURAL EFFECTS; THERMAL EXPANSION COEFFICIENTS;

ANNEALING;

EID: 13444249915     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2004.08.005     Document Type: Conference Paper

References (17)

1. International Technology Roadmap for Semiconductors (ITRS), Interconnect Topic, 2003
2. S. Lardenois, D. Pascal, L. Vivien, E. Cassan, S. Laval, R. Orobtcouk, M. Heitzman, N. Bouzaid, and L. Mollard Opt. Lett. 28 2003 1150
3. K.K. Lee, D.R. Lim, L.C. Kimerling, J. Shin, and F. Cerrina Opt. Lett. 26 2001 1988
4. M. El Kurdi, P. Boucaud, S. Sauvage, O. Kermarrec, Y. Campidelli, D. Bensahel, G. Saint-Giron, and I. Sagnes Appl. Phys. Lett. 80 2002 509
5. L. Masarotto, J.M. Hartmann, G. Bremond, G. Rolland, A.M. Papon, and M.N. Semeria J. Cryst. Growth 255 2003 8
6. P.M. Mooney, F.K. LeGoues, and J.L. Jordan-Sweet Appl. Phys. Lett. 65 1994 2845
7. M.T. Currie, S.B. Samavedam, T.A. Langdo, C.W. Leitz, and E.A. Fitzgerald Appl. Phys. Lett. 72 1998 1718
8. R. Calarco, M. Fiordelisi, S. Lagomarsino, and F. Scarinci Thin Solid Film 391 2001 138
9. J. Oh, J.C. Campbell, S.G. Thomas, D. Bharatan, R. Thoma, C. Jasper, R.E. Jones, and T.E. Zirkle IEEE. J. Quantum Electron. 38 2002 1238
10. L. Colace, G. Masinni, F. Galluzzi, G. Assento, G. Capellini, L. Di Gaspare, E. Palage, and F. Evangelisti Appl. Phys. Lett. 72 1998 3175
11. H.-C. Luan, D.R. Lim, K.L. Lee, K.M. Chen, J.G. Sandland, K. Wada, and L.C. Kimerling Appl. Phys. Lett. 75 1999 2909
12. L. Colace, G. Masinni, G. Assento, H.-C. Luan, K. Wada, and L.C. Kimerling Appl. Phys. Lett. 76 2000 1231
13. H.-C. Luan, K. Wada, L.C. Kimerling, G. Masinni, L. Colace, and G. Assento Opt. Mater. 17 2001 71
14. L.H. Nguyen, V. Le Thanh, D. Debarre, V. Yam, and D. Bouchier Mater. Sci. Eng. B 101 2003 199
15. M. Halbwax, V. Yam, C. Clerc, Y. Zheng, D. Debarre, L.H. Nguyen, and D. Bouchier Phys. Status Solidi (a) 201 2004 329
16. Y. Ishikawa, K. Wada, D.D. Cannon, J. Liu, H.-C. Luan, and L.C. Kimerling Appl. Phys. Lett. 82 2003 2044
17. R. People IEEE J. Quantum Electron. 22 1986 1696