Effect of aluminium ion implantation on the oxidation resistance of DC magnetron sputter-deposited TiB2 thin films

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 185-197

  Mollica, S ^a   Sood, D K ^a   Evans, P J ^b   Noorman, J T ^b   Dytlewski, N ^b   Brack, N ^c   Pigram, P ^c   Latham, K ^a  

^a RMIT UNIVERSITY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^c LA TROBE UNIVERSITY   (Australia)

Author keywords

Aluminium oxide; High temperature oxidation; Ion implantation; Metastable phases; Thin films; Titanium diboride

Indexed keywords

ALUMINUM; ION IMPLANTATION; OXIDATION RESISTANCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

BARRIER LAYERS; METASTABLE PHASES;

THIN FILMS;

CORROSION PROTECTION; CORROSION RESISTANCE; HIGH TEMPERATURE APPLICATION; ION IMPLANTATION; OXIDATION;

EID: 1342311287     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.06.027     Document Type: Article

References (37)

1. Kulpa A. Troczynski T. J. Am. Ceram. Soc. 79 1996 518-520
2. Barandika M.G. Echeberria J.J. Sanchez J.M. Castro F. J. Mater. Chem. 8 1998 1851-1857
3. Voitovich V.B. Lavrenko V.A. Adejev V.M. Oxid. Met. 42 1994 145-161
4. Sood D.K. Mukherjee S. Katselis G., et-al. Surf. Coat. Technol. 103-104 1998 304-311
5. Vardiman R.G. Acta Metall. Mater. 40 1992 1029-1035
6. Knight S.T. Evans P.J. Samndi M. Nucl. Instrum. Methods Phys. Res. B 119 1996 501-504
7. Umakoshi Y. Yamaguchi M. Sakagami T. Yamane T. J. Mater. Sci. 24 1989 1599-1603
8. Li X.Y. Taniguchi S. Zhu Y.-C., et-al. Nucl. Instrum. Methods Phys. Res. Section B (Beam Interactions Mater. Atoms) 187 2002 207-214
9. Mitsuo A. Uchida S. Nihira N. Iwaki M. Surf. Coat. Technol. 103-104 1998 98-103
10. Mukundhan P. Du H.H. Withrow S.P. J. Am. Ceram. Soc. 85 2002 865-872
11. Cheong Y.S. Mukundhan P. Du H.H. Withrow S.P. J. Am. Ceram. Soc. 83 2000 161-165
12. A. Mitsuo, T. Aizawa, Thermal oxidation and characterization for surface layers of Al implanted TiN films, Proceedings of the International Conference on Ion Implantation Technology, Kyoto, Japan, 1999
13. Smith P.J. Beauprie R.M. Smeltzer W.W. Stevanovic D.V. Thompson D.A. Oxid. Met. 28 1987 259-276
14. Yang Z. Du H. Withrow S.P. Beam-Solid Interact. Mater. Synth. Characterization 354 1995 307-312
15. Taniguchi S. Uesaki K. Zhu Y.-C. Matsumoto Y. Shibata T. Mater. Sci. Eng. A 266 1999 267-275
16. S. Taniguchi, K. Kondoh, T. Shibata, et al., Influence of implantation of a few metal ions on the oxidation behaviour of TiAl at high temperatures, International Conference on Ion Implantation Technology, Kyoto, Japan, 1999
17. Mollica S. Sood D.K. Evans P.J. Dytlewski N. Short K.T. Nucl. Instrum. Methods Phys. Res. B 190 2002 736-741
18. Shappirio J.R. Finnegan J.J. Thin Solid Films 107 1983 81-87
19. Haanappel V.A.C. Stroosnijder M.F. Surf. Coat. Technol. 105 1998 147-154
20. Moulder J.F. Stickle W.F. Sobol P.E. Bomben K.D. Handbook of X-Ray Photoelectron Spectroscopy first ed. 1995 Physical Electronics, Inc
21. Riviere J.P. Miguet S. Cahoreau M. Chaumont J. Delafond J. Surf. Coat. Technol. 84 1996 398-403
22. I.C.f.D.D. (ICDD), International Centre for Diffraction Data (ICDD), Powder Diffraction File from PDF-2 database, PDF-2 Database ed. Philadelphia, USA, ICDD, 2001
23. Available from: http://www.lasurface.com/ XPS Database, vol. 2002
24. Chen S. Zhang W. Zhang Y., et-al. Scripta Metall. Mater. 27 1992 455-460
25. Kim S.-H. Lee D.-B. J. Korean Inst. Met. Mater. 38 2000 1664-1669
26. Lee D.B. Kim S.H. Niinobe K. Yang C.W. Nakamura M. Mater. Sci. Eng. A 290 2000 1-5
27. Murakani Y. Takeyama M.B. Noya A. Trans. Inst. Electr. Inform. Commun. Eng. C-II J81C-II 1998 848-856
28. Parfitt L.J. Smialek J.L. Nic J.P. Mikkola D.E. Scripta Metall. Mater. 25 1991 727-731
29. Irving R.J. Worsley I.G. J. Less-Common Met. 16 1968 103-112
30. Lee D.B. Lee Y.C. Kim D.J. Oxid. Met. 56 2001 177-189
31. Anders S. Anders A. Brown I.G. J. Appl. Phys. 74 1993 4239-4241
32. Anders S. Anders A. Brown I.G. MacGill R.A. Dickinson M.R. Rev. Sci. Instrum. 5-65 1994 1319-1321
33. A. Anders, S. Anders, I.G. Brown, R.A. MacGill, M.R. Dickinson, Vacuum arc plasma deposition: macroparticle filtering, scaling and other problems, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, Moscow, St. Petersburg, Russia, 1994
34. Anders A. Anders S. Brown I.G. Plasma Sources Sci. Technol. 4 1995 1-12
35. Anders A. J. Appl. Phys. 82 1997 3679-3688
36. Anders S. Anders A. Dickinson M.R. MacGill R.A. Brown I.G. IEEE Trans. Plasma Sci. 25 1997 670-674
37. Zhu Y.-C. Li X.Y. Fujita K., et-al. Surf. Coat. Technol. 158-159 2002 503-507