Modification of high-temperature oxidation of titanium diboride films by implantation with tantalum and titanium ions

Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 304-311

  Sood, D K ^a   Mukherjee, S ^a   Katselis, G ^a   Brown, I G ^b   Prince, K E ^c   Short, K T ^c   Evans, P J ^c  

^a RMIT UNIVERSITY   (Australia)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

High temperature oxidation; Ion implantation; Stainless steel 430; Titanium diboride films

Indexed keywords

HIGH TEMPERATURE APPLICATIONS; ION IMPLANTATION; OXIDATION; OXIDATION RESISTANCE; PROTECTIVE COATINGS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SPUTTER DEPOSITION; STAINLESS STEEL; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

ION DAMAGE; TITANIUM DIBORIDE FILMS;

SURFACE TREATMENT;

EID: 0032068250     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00428-9     Document Type: Article

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