Influence of implantation of a few metal ions on the oxidation behaviour of TiAl at high temperatures

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1086-1089

  Taniguchi, S ^a   Kondoh, K ^a   Shibata, T ^a   Suzuki, Y ^a   Matsumoto, Y ^a   Zhu, Y C ^a   Zhang, H X ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ARGON; AUGER ELECTRON SPECTROSCOPY; CHROMIUM; ENERGY DISPERSIVE SPECTROSCOPY; INTERMETALLICS; ION IMPLANTATION; NIOBIUM; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON;

ACCELERATION VOLTAGE;

TITANIUM ALLOYS;

EID: 0033329687     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)