Ion beam analysis of aluminium ion implanted titanium diboride thin films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 190, Issue 1-4, 2002, Pages 736-741

  Mollica, S ^a   Sood, D K ^a   Evans, P J ^b   Dytlewski, N ^b   Short, K T ^b  

^a RMIT UNIVERSITY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

High temperature oxidation; Ion implantation; Thin films; Titanium diboride

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTALLINE MATERIALS; HIGH TEMPERATURE APPLICATIONS; ION BEAMS; ION IMPLANTATION; MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; OXIDATION RESISTANCE; SILICON; SINGLE CRYSTALS; TITANIUM COMPOUNDS;

HIGH TEMPERATURE OXIDATION;

THIN FILMS;

EID: 0036569156     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00465-2     Document Type: Conference Paper

References (11)