Oxidation behavior of TiAl protected by Al and Nb combined ion implantation at high temperature

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 187, Issue 2, 2002, Pages 207-214

  Li, X Y ^a   Taniguchi, S ^b   Zhu, Y C ^a   Fujita, K ^a   Iwamoto, N ^a   Matsunaga, Y ^c   Nakagawa, K ^c  

^a Ion Eng Res Institute Corporation   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c IHI CORPORATION   (Japan)

Author keywords

Al; Al2O3 layer; High temperature; Ion implantation; Nb; Oxidation; TiAl

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; CONTAMINATION; HIGH TEMPERATURE EFFECTS; OXIDATION; OXIDATION RESISTANCE; PARTICLE ACCELERATORS; SCANNING ELECTRON MICROSCOPY; TITANIUM ALLOYS; X RAY DIFFRACTION ANALYSIS;

ACCELERATING VOLTAGE;

ION IMPLANTATION;

EID: 0036467083     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00934-X     Document Type: Article

References (13)