Stress relaxation during annealing of boron nitride films

Thin Solid Films

Volumn 389, Issue 1-2, 2001, Pages 173-179

  Fitz, C ^a   Kolitsch, A ^a   Fukarek, W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Boron nitride; Heat treatment; Stress

Indexed keywords

ANNEALING; COMPRESSIVE STRESS; CUBIC BORON NITRIDE; DEPOSITION; STRESS RELAXATION; THERMAL STRESS;

STRESS DEPTH PROFILE;

SEMICONDUCTING FILMS;

EID: 0035876520     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00899-9     Document Type: Article

References (24)