Synchroton radiation micro lithography and etching (SMILE) for MEMS fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5062, Issue 2, 2002, Pages 821-832

  Sugiyama, Susumu ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING; HELIUM; MICROMACHINING; PRESSURE EFFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SYNCHROTRON RADIATION; VACUUM APPLICATIONS; X RAY LITHOGRAPHY;

HIGH ASPECT RATIO MICROSTRUCTURE TECHNOLOGY; PLANE PATTERN TO CROSS SECTION TRANSFER TECHNIQUE;

MICROELECTROMECHANICAL DEVICES;

EID: 1342269577     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)

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