Sub-micron liga process for movable microstructures

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 505-508

  Borner M W ^a,b   Kohl, M ^b   Pantenburg, F J ^b   Bacher, W ^b   Hein, H ^b   Schomburg, W K ^b  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COST EFFECTIVENESS; ECONOMICS; ELECTROPLATING; MASKS; MICROSTRUCTURE; PHOTORESISTS; X RAY LITHOGRAPHY;

MOVABLE MICROSTRUCTURES; SUB MICRON LIGA PROCESS; SUB MICRON RANGE; X RAY MASK;

MICROELECTRONIC PROCESSING;

EID: 0029754621     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00296-0     Document Type: Article

References (6)

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