Single crystal silicon (SCS) XY-stage fabricated by DRIE and IR alignment

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2000, Pages 28-33

  Lee, Chris S B ^a   Han, Sejin ^a   MacDonald, Noel C ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; MICROACTUATORS; REACTIVE ION ETCHING; SILICON WAFERS; SINGLE CRYSTALS;

COMB-DRIVE ACTUATORS; DEEP SILICON ETCHING; MICROPOSITIONING;

MICROELECTROMECHANICAL DEVICES;

EID: 0033721568     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)