X-Ray Mask with SiC Membrane for LIGA Process

IEEJ Transactions on Sensors and Micromachines

Volumn 119, Issue 4, 1999, Pages 229-235

  Ueno, Hiroshi ^a   Hosaka, Makoto ^a   Tabata, Osamu ^a   Konishi, Satoshi ^a   Sugiyama, Susumu ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

high aspect ratio microstructure; LIGA process; SIC membrane; X ray mask

Indexed keywords

EID: 85010144302     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.119.229     Document Type: Article

References (10)

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