Development of ultrahigh vacuum floating-type low-energy ion gun with differential pumping facilities for high-resolution depth profiling

Surface and Interface Analysis

Volumn 37, Issue 2, 2005, Pages 171-175

  Mizuhara, Y ^a   Bungo, T ^a   Nagatomi, T ^a   Takai, Y ^a   Suzuki, S ^b   Kikuchi, K ^b   Sato, T ^b   Uta, K ^c  

^a OSAKA UNIVERSITY   (Japan)

^b Biemtron Co Ltd   (Japan)

^c UNSYS   (Japan)

Author keywords

Aluminum arsenide; Auger electron spectroscopy; Gallium arsenide; Ion bombardment; Ion solid interactions; Low energy ions; Sputter depth profiling; Sputtering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CURRENT DENSITY; ION SOURCES; IONS; POSITIVE IONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

FLOATING-TYPE LOW-ENERGY IONS (FLIG); ION-SOLID INTERACTIONS; LOW-ENERGY IONS; SPUTTER DEPTH PROFILING;

ULTRAHIGH VACUUM;

EID: 13244270013     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1957     Document Type: Conference Paper

References (22)

1. Clegg JB. J. Vac. Sci. Technol. 1995; A13:143.
2. Dowsett MG, Smith NS, Bridgeland R, Richards D, Lovejoy AC, Pedrick P. In Proceedings of the Tenth International Conference on Secondary Ion Mass Spectrometry (SIMS-X), Benninghoven A, Hagenhoff B, Wemer HW (eds). John Wiley: Chichester, 1997; 367.
3. Smith NS, Dowsett MG, McGregor B, Phillips P. In Proceedings of the Tenth International Conference on Secondary Ion Mass Spectrometry (SIMS-X), Benninghoven A, Hagenhoff B, Werner HW (eds). John Wiley: Chichester, 1997; 363.
4. Lee JC, Jeong CS, Rang HJ, Kim HK, Moon DW. Appl. Surf. Sci. 1996; 100/101: 97.
5. Oh DW, Oh SK, Kang HJ, Lee HI, Moon DW. Nucl. Instrum. Methods 2002; B190: 598.
6. Shimizu R, Inoue M. J. Surf. Anal. 2003; 10:154.
7. Matsutani T, Iwamoto K, Nagatomi T, Kimura Y, Takai Y, Shimizu R, Aihara R, Sakuma Y. J. Vac. Soc. Jpn. 2000; 43:1126.
8. Mizuhara Y, Kato J, Nagatomi T, Takai Y, Aoyama T, Yoshimoto A, Inoue M, Shimizu R. Surf. Interface Anal. 2003; 35: 382.
9. Matsutani T, Iwamoto K, Nagatomi T, Kimura Y, Takai Y, Shimizu R, Aihara R, Sakuma Y. J. Surf. Anal. 2000; 7: 314.
10. Matsutani T, Iwamoto K, Nagatomi T, Kimura Y, Takai Y. Jpn. J. Appl. Phys. 2001; 40: L481.
11. Kato J, Nagatomi T, Takai Y. J. Appl. Phys. 2003; 94: 6372.
12. Mizuhara Y, Kato J, Nagatomi T, Takai Y, Inoue M. J. Appl. Phys. 2002; 92: 6128.
13. Mizuhara Y, Kato J, Nagatomi T, Takai Y. Jpn. J. Appl. Phys. 2003; 42: L709.
14. Bungo T, Mizuhara Y, Nagatomi T, Takai Y. Jpn. J. Appl. Phys. 2003; 42: 7580.
15. Inoue M, Kurahashi K, Kodama K. J. Surf. Anal. 2003; 10:197 (in Japanese).
16. ISO-14606:2000(E). Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials. ISO Copyright Office, PO Box 56, CH-1221, Geneva.
17. Hofmann S. Surf. Interface Anal. 1994; 21: 673.
18. Lee HI, Shimizu R. J. Vac. Sci. Technol. 1998; B16: 2528.
19. Satori K, Haga Y, Minatoya R, Aoki A, Kajiwara K. J. Vac. Sci. Technol. 1997; A15: 478.
20. Hofmann S. Appl. Surf. Sci. 1993; 70/71: 9.
21. Zalar A. Thin Solid Films 1985; 124: 223.
22. Hofmann S. Rep. Prog. Phys. 1998; 61: 827.