SCOPUS 정보 검색 플랫폼

Electroanalysis

Volumn 13, Issue 11, 2001, Pages 911-916

Development of metal-based microelectrode sensor platforms by chemical vapor deposition

(3) Bozou, Jérôme P a Giolando, Dean M a Kirchhoff, Jon R a

a UNIVERSITY OF TOLEDO (United States)

Author keywords

Chemical vapor deposition; Microelectrodes; Modified electrodes; Sensors

Indexed keywords

CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL SENSORS; MICROCAVITIES; SILICA; SILVER;

CHEMICAL VAPOUR DEPOSITION; DEPOSITION COATING; DEPOSITION ELECTRODES; ELECTRODE MODIFICATION; INSULATING LAYERS; MICROELECTRODE SENSORS; MODIFIED ELECTRODES; SENSOR PLATFORM; TUNGSTEN WIRES; VAPOR-DEPOSITION TECHNIQUES;

MICROELECTRODES;

COPPER; METAL; SILVER; TUNGSTEN;

AQUEOUS SOLUTION; ARTICLE; DEVICE; ELECTROCHEMICAL ANALYSIS; ELECTROPLATING INDUSTRY; METHODOLOGY; MICROELECTRODE; MICROSCOPY; SENSOR; TECHNIQUE; VALIDATION PROCESS; VAPOR; VAPORIZATION;

EID: 0034859398 PISSN: 10400397 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4109(200107)13:11<911::AID-ELAN911>3.0.CO;2-0 Document Type: Article

Times cited : (9)

References (10)

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