Improved materials meeting the demands for EUV substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 219-226

  Mitra, Ina ^a   Alkemper, Jochen ^a   Nolte, Uwe ^a   Engel, Axel ^a   Müller, Rolf ^a   Ritter, Simone ^a   Hack, Hrabanus ^a   Megges, Klaus ^a   Kohlmann, Heiko ^a   Pannhorst, Wolfgang ^a   Davis, Mark J ^b   Aschke, Lutz ^c   Knapp, Konrad ^c  

^a SCHOTT AG   (Germany)

^b Schott Glass Technologies   (United States)

^c Schott Lithotec AG   (Germany)

Author keywords

CTE homogeneity; EUVL; Glass ceramics; Substrate; Surface roughness; Thermal expansion; Zerodur

Indexed keywords

DEFORMATION; INTERFEROMETERS; NONDESTRUCTIVE EXAMINATION; OPTIMIZATION; PROCESS ENGINEERING; SUBSTRATES; SURFACE ROUGHNESS; TEMPERATURE MEASUREMENT; THERMAL EXPANSION;

COEFFICIENT OF THERMAL EXPANSION; EXTREME ULTRAVIOLET LITHOGRAPHY; SUPER POLISHED SURFACES; SURFACE DEFORMATION;

LITHOGRAPHY;

EID: 0141501391     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484728     Document Type: Conference Paper

References (6)

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2. I. Mitra, M. J. Davis, J. Alkemper, R. Müller, H. Kohlmann, L. Aschke, E. Mörsen, S. Ritter, H. Hack, W. Pannhorst: "Thermal Expansion Behavior of Proposed EUVL Substrate Materials", Proceedings SPIE Vol. 4688 (2002), p. 462-68
3. SEMI standard P 37: "Specification for Extreme Ultraviolet Lithography Mask Substrates"
4. R. Mueller, K. Erb, R. Haug, A. Klaas, O. Lindig, G. Wetzig: "Ultraprecision Dilatometer System for Thermal Expansion measurements on Low Expansion Glasses", 12th Thermal Expansion Symposium, Pittsburgh/PA, P.S. Gaal and D.E. Apostolescu eds., 1997
5. J.H. Bruning et al., Applied Optics, Vol. 13, No. 11, p. 2693-2703, 1994
6. C.W. Chung et al., SPIE Vol. 316, "High Resolution Soft X-Ray Optics", p. 9-15, 1981