Illumination optics design for EUV-lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4146, Issue 1, 2000, Pages 25-34

  Antoni, Martin ^a   Singer, Wolfgang ^a   Schultz, Jöerg ^a   Wangler, Johannes ^a   Escudero Sanz, Isabel ^b   Kruizinga, Bob ^b  

^a CARL ZEISS SMT AG   (Germany)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; OPTICAL INSTRUMENT LENSES; OPTICAL PROJECTORS; REFLECTION; ULTRAVIOLET RADIATION;

ILLUMINATION OPTICS;

PHOTOLITHOGRAPHY;

EID: 0034504254     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.406673     Document Type: Article

References (0)