Mo/Si multilayer coating technology for EUVL, coating uniformity and time stability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4146, Issue 1, 2000, Pages 60-63

  Louis, E ^a   Yakshin, A E ^a   Gorts P C ^a   Oestreich, S ^a   Maas, E L G ^a   Kessels, M J H ^a   Schmitz, D ^b   Scholze, F ^b   Ulm, G ^b   Mullender, S ^c   Haidl, M ^c   Bijkerk, F ^a  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c CC1 Zeiss ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; EVAPORATION; OPTICAL MULTILAYERS; OPTICAL PROJECTORS; OPTICAL SYSTEMS; OPTIMIZATION; REFLECTION; REFLECTIVE COATINGS; ULTRAVIOLET RADIATION;

CONCAVE SURFACES; ION BEAM SMOOTHENING;

PHOTOLITHOGRAPHY;

EID: 17744400483     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.406676     Document Type: Article

References (0)