Mirror substrates for EUV-lithography: Progress in metrology and optical fabrication technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4146, Issue 1, 2000, Pages 35-46

  Dinger, U ^a   Eisert, F ^a   Lasser, H ^a   Mayer, M ^a   Seifert, A ^a   Seitz, G ^a   Stacklies, S ^a   Stickel, F J ^a   Weiser, M ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICS; IMAGING SYSTEMS; LIGHT REFLECTION; MIRRORS; OPTICAL FIBER FABRICATION; ULTRAVIOLET RADIATION;

HIGH SPATIAL FREQUENCIES;

PHOTOLITHOGRAPHY;

EID: 0034506571     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.406674     Document Type: Article

References (0)