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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 11 A, 2004, Pages 7802-7806

Static optical recording properties of super-resolution near-field structure with bismuth mask layer

(4) Zhang, Feng a Wendong, X U a Wang, Yang a Gan, Fuxi a

a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS (China)

Author keywords

Antimony; Bismuth; Mask layer; Static optical recording; Super resolution near field structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH; HIGH RESOLUTION ELECTRON MICROSCOPY; LASER BEAMS; MASKS; SEMICONDUCTING ANTIMONY; THIN FILMS; X RAY DIFFRACTION;

MASK LAYERS; STATIC OPTICAL RECORDING; SUPER-RESOLUTION NEAR-FIELD STRUCTURE (SUPER-RENS); TRANSMITTED APERTURE (TA);

OPTICAL RECORDING;

EID: 11144224149 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.7802 Document Type: Article

Times cited : (9)

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